Expansion of the Cutting-edge ArF Photoresist Business for use in Semiconductor Manufacturing! Introduction of 45nm/32nm node Compatible “ArF Immersion Exposure Tool” aimed at Enhancing the Development of Next-Generation Immersion Photoresist

January 12, 2008

Expansion of the Cutting-edge ArF Photoresist Business for use in Semiconductor Manufacturing!
Introduction of 45nm/32nm node Compatible “ArF Immersion Exposure Tool” aimed at Enhancing the Development of Next-Generation Immersion Photoresist

FUJIFILM Corporation (President and CEO: Shigetaka Komori, hereafter “FUJIFILM”) outdid the competition in 2006 with its development of the “FAiRS-9000 Series,” a 45nm node*1 compatible ArF immersion photoresist that does not require topcoat (protective film) and offered samples of it in the same year. FUJIFILM now plans to introduce the latest “ArF immersion exposure tool” and further improves development aimed at the commencement of 45nm node mass production by large semiconductor manufacturers and thereby expand its cutting-edge ArF photoresist business.

FUJIFILM’s “FAiRS-9000 Series” is regarded by semiconductor manufacturers as the best for the next-generation semiconductor manufacturing process due to not only its lithography performance, but also its great reduction of pattern defects. FUJIFILM plans to leverage the “ArF immersion exposure tool” and move past the 45nm node to develop next-generation semiconductor photoresist of the best quality in the 32nm node as well.

The “ArF immersion exposure tool” is compatible with 45nm/32nm node ArF immersion lithography processes*2 and will be introduced by the Electronic Materials Research Laboratories (Yoshida-cho, Haibara-gun, Shizuoka) which is FUJIFILM’s research and development center for photoresist products. By introducing a “coater and developer” along with the “ArF immersion exposure tool,” FUJIFILM will enable consistent evaluation of ArF immersion photoresists and therefore be able to respond to the needs of the customer even quicker than before.

It is hoped that ArF immersion lithography technology will be adaptable to the forming of finer circuit patterns in 32nm node semiconductor devices through the application of the “double patterning process.”*3 FUJIFILM is enhancing its development of materials that will enable simple processes in generations to follow 32nm that cost less and are highly productive.

FUJIFILM has positioned semiconductor materials as a growth business and aims to capture a large share of the market. It will continue with research and development that contributes to the further development of the semiconductor industry and provide customers with the highest quality next-generation immersion photoresist.

*1 A generation of semiconductor device technology. Indicates basic design dimensions for circuit patterns. 65nm node mass production is currently under way. It is predicted that full scale mass production of 45nm node will commence around 2010.

*2 Exposure process used for forming circuit patterns in 45nm node and smaller semiconductor devices that uses an ArF (argon fluoride) laser as a light source. Method for improving optical resolution by filling the gap between an exposure projection lens and the photoresist film, that is coated on a silicon substrate, with water.

*3 Method for preventing a decrease in resolution that occurs when the number of layers of optical images increases in dense circuit patterns. Method that does not form the final number of patterns at once on a substrate, but rather first jumps around and forms patterns that are not dense, and then forms other patterns in between these patterns thereby forming a dense pattern that has high resolution.

Media Contact:
FUJIFILM Corporation
Corporate Public Relations Division
Tel: 81-3-6271-2000

Customer Contact:
FUJIFILM Corporation
Electronic Materials Division
Tel: 81-3-6271-2155

Fujifilm Website:
Japanese: http://fujifilm.jp/
English: http://www.fujifilm.com/

Moving the Global Environmental Policy of the Fujifilm Group One Step Forward The 12th Fujifilm Group International Environment Meeting

January 12, 2008

Moving the Global Environmental Policy of the Fujifilm Group One Step Forward
The 12th Fujifilm Group International Environment Meeting

FUJIFILM Corporation (President and CEO Shigetaka Komori, hereafter “FUJIFILM”) held the “Fujifilm Group International Environment Meeting” from November 5 to 8 at its Tokyo headquarters with the aim of advancing our Medium-term Environmental Policy (i.e. “The Fujifilm Group Green Policy”*1) on a global level.

First begun in 1991, this conference brings together environmental experts from Fujifilm Group companies involved in the production and marketing of FUJIFILM products in Japan, the U.S., Europe, China and other countries in order to share information on the regulations and activities of manufacturer’s associations in their respective countries and to promote global environmental initiatives.

At this year’s meeting, the 12th of the series, participants engaged in vigorous discussions on a variety of themes, sharing with each other the latest information and survey results from each region. These themes included environmental issues such as the reduction of greenhouse gases and worldwide efforts to strengthen the control of chemical substances. Examples of the latter were REACH*2, the new regulation for chemical substances that was enforced in Europe in June; the more stringent regulation of chemical substances in products throughout the world; and the GHS*3 regulation that is spreading to more countries. Our intent is to promote even greater sharing of information and closer communications in order to implement even better environmental strategies in each region of the world.

Summaries of the main themes discussed at the conference are given below.

Initiatives toward Compliance with REACH

In June of this year, the chemical regulation REACH went into force within Europe, including long term-used existing chemicals as well as heretofore unregulated chemicals in manufactured articles. With its enforcement, REACH will require the pre-registration of chemicals from next year. As a company that manufactures photographic processing chemicals, digital cameras, FCR digital X-ray imaging and diagnostic systems for medical care and a wide range of other products, ranging from the mixing of chemicals to the formation of the final product, FUJIFILM is laying the preparatory groundwork for compliance in Europe and Japan. This includes the establishment of project teams, construction of databases and the conducting of surveys on the wide range of chemicals subject to the regulation. At the meeting, the participants exchanged the most recent details about the regulation and information about hard-to-evaluate items, such as the definition of articles; and ascertained the situation with regard to surveys in Europe and Japan and compared their contents. From now, we plan to strengthen the ties between Europe and Japan as we continue laying the groundwork to allow the pre-registration work in Europe to be conducted smoothly and efficiently.

Initiatives toward Compliance with GHS

In December 2006, Japan became the first country to incorporate the GHS system as part of its Industrial Safety and Health Law and to put it into effect. In other countries, especially in Asian countries, considerations are being made to adopt GHS, with 2008 as a target. At this meeting, information was exchanged on trends in the adoption of GHS in the various areas, and the state of worldwide compliance, especially in the Asia-Pacific region, was discussed. FUJIFILM intends to continue exchanging information on GHS implementation with the aim of achieving strict compliance.

Improvement in Eco-Efficiency

Through its promotion of various environmental strategies, FUJIFILM has set the goal of improving eco-efficiency by a factor of two by FY2010, compared to FY2000, in the six environmental burdens*4, including greenhouse gas emissions and waste generation. At the meeting, our overseas Group companies were able to jointly confirm the amount of greenhouse gases and waste produced, for which even more reduction efforts are demanded. Our intent from now is to promote strategies that take into account the special characteristics of the locality, such as the conversion of methane gas at landfill sites into fuel.

FUJIFILM, together with its domestic companies and overseas partners, hopes to contribute to society by achieving an even higher level of “environmental quality” and “sustainable development.”

(*1) Fujifilm Group’s common medium-term environmental policy that aims to stay at the forefront of efforts to attain “sustainable development” in terms of environmental, economic and social aspects. We will also strive for customer satisfaction by achieving high “environmental quality” in products, services and corporate activities.

(*2) REACH: The Registration, Evaluation and Authorization and Restriction of Chemicals

(*3) GHS: Globally Harmonized System of Classification and Labelling of Chemicals

(*4) Greenhouse gas emissions, consumed natural resources, atmospheric emissions of volatile organic compounds, consumed packaging materials, waste generation and water consumption.

Media Contact:
FUJIFILM Corporation
Corporate Public Relations Division
Tel: 81-3-6271-2000

Customer Contact:
Ecology and Quality Management Division
Tel: 81-3-6271-2064

Fujifilm website:
Japanese :http://fujifilm.jp/
English : http://www.fujifilm.com/

Price Revision of Industrial X-ray Film

January 12, 2008

Price Revision of Industrial X-ray Film

FUJIFILM Corporation (President & CEO: Shigetaka Komori) has decided to revise the price of its Industrial X-ray Film from October 2007 onward.

For many years FUJIFILM has supplied its Industrial X-ray Film to a wide range of customers, and has thus made an important contribution in a variety of industries. FUJIFILM Industrial X-Ray Film is used for the inspections of welding and casting operations, and in a variety of plant maintenance inspections. However, in addition to the increasing digitalization of inspection methods, the price of key raw materials, such as silver, has soared over recent years. FUJIFILM has exerted the utmost efforts to absorb these increased costs by reducing expenses and enhancing productivity. However, this practice has now proved unsustainable.

For the above reasons, the price of Industrial X-ray Film will be revised as follows:
1. Product name: FUJIFILM Industrial X-Ray Film
2. Date of increase:
Japanese market: Products shipped from November 1, 2007
Export: Products shipped from October 1, 2007 onward (*)
(*) For the global market, the date of increase will differ depending on the country.
3. Increase rate: 5% to 30% (**)
(**) The above rate is for the price of the product sold by the manufacturer.
The rate will differ depending on the type of the product.

Thank you for your kind understanding.

If you have any questions, please contact
FUJIFILM Corporation Industrial Products Div.
Tel: 81-3-6271-3009
Website : http://www.fujifilm.com/

Fujifilm Reinforces the Foundation of its Digital Camera Business Promoting cost competitiveness and increasing the pace of product development by optimizing its manufacturing and R&D business bases

January 12, 2008

Fujifilm Reinforces the Foundation of its Digital Camera Business
Promoting cost competitiveness and increasing the pace of product development by optimizing its manufacturing and R&D business bases

FUJIFILM Corporation (President and CEO Shigetaka Komori, hereafter “FUJIFILM”) has been leading the digital camera industry by supplying worldwide the FinePix series of digital cameras featuring unique advanced technologies such as “high-sensitivity and high-image quality” and the world first “Face Detection Technology.” Toward further business expansion in the future, FUJIFILM has decided to concentrate its manufacturing and R&D bases, as more detailed below. The change is to create a solid business structure optimized for the digital camera market amidst intensifying competition

1. Full transfer of digital camera production operation to China and reinforcement of cost competitiveness through external subcontracting of the CCD production.

Digital camera production operation will be fully transferred to our Chinese factory (Suzhou), which has been increasingly shifted by now. A preliminary agreement has been reached to subcontract the CCD’s pre-process production (wafer process) to Toshiba Corporation, which has a broad semiconductor production technology. The move will combine FUJIFILM’s cutting-edge R&D capacity and the specialized manufacturer’s advanced technological capacity to further enhance FUJIFILM’s proprietary Super CCD’s performance and functions speedily. FUJIFILM Photonix Co., Ltd., based in Taiwa-cho, Kurokawa-gun, Miyagi Prefecture, will be disbanded in response to the transfer of digital camera production operations (scheduled for August 2008). Also a preliminary agreement has been reached to sell the related land and buildings in Izumi-ku, Sendai-shi, Miyagi Prefecture to Murata Manufacturing Co., Ltd, due to the above mentioned external subcontracting of CCD’s pre-process production.

2. Increasing efficiency and pace of product development by concentration of business bases and promoting function reinforcement.

The functions of R&D, procurement and quality assurance will be concentrated at the business base in Taiwa-cho, Kurokawa-gun, Miyagi Prefecture, which currently serves the function of developing production technologies. The concentration of business bases will reinforce each function and streamlining process, while increasing the pace of product development. A new company (FUJIFILM Digital Techno Co., Ltd.) will be set up in the same base to serve the functions of centrally controlling after-sales services, reinforcing production technologies and undertaking CCD post-process production (assembly & testing) of digital cameras.

In October last year, FUJIFILM launched the “Slim&Strong” drive to create a more brawny, more robust company. All processes of the photographic film business and other business areas are being reviewed to deliver faster speed, stronger functionality and improved efficiency. In anticipation of intensified competition in the digital camera business, the existing approach of enhancing product strength and worldwide sales operations will be combined with efforts to streamline the organizational structure / workforce / facilities. In addition, the concentration of operation bases and the establishment a new company for added functionality will contribute to the building of a business foundation with greater strength and flexibility.

There will be further acceleration in the development of digital cameras with distinctive features, combining FUJIFILM’s proprietary Super CCD technology, superior image processing technology, and the advanced lens technology of the Group company, Fujinon Corporation. This will demonstrate our commitment to contributing to further nurturing the “Culture of Photography.”

Media Contact:
FUJIFILM Corporation Public Relations Division
Tel: 81-3-6271-2000
Fujifilm website:
English : http://www.fujifilm.com/

Fujifilm and Mitsubishi Paper Mills forge partnership in the photographic business

January 12, 2008

Fujifilm and Mitsubishi Paper Mills forge partnership in the photographic business

FUJIFILM Corporation
Mitsubishi Paper Mills Ltd.

FUJIFILM Corporation (President and CEO Shigetaka Komori, hereafter “FUJIFILM”) and Mitsubishi Paper Mills Ltd. (President Takeshi Sato, hereafter “Mitsubishi Paper Mills”) have reached a basic agreement to forge a partnership in the photographic business, with focus on the area of photographic paper, to mutually reinforce their business operations and international competitiveness. The two companies will enter into further detailed negotiations in the near future.

The recent proliferation of digital cameras has diversified the ways consumers enjoy photography, e.g. viewing shots on computers or sending them over the Internet, in addition to the silver halide photography prints*1 printed on conventional photographic papers. At the same time, the number of photos people take with digital cameras has substantially increased, pointing to a demand surge for high-quality, fade-resistant silver halide photo prints.
For many years, FUJIFILM and Mitsubishi Paper Mills have developed quality photographic papers in response to various customer needs, and expanded the demand for silver halide prints across the world.
This partnership between FUJIFILM and Mitsubishi Paper Mills is aimed at improving efficiency and mutually reinforcing their business operations through allowing the companies to tap into each other¡Çs advanced technological capacity in their respective fields of expertise, to build a cooperate relationship for photographic paper production with a global perspective.

FUJIFILM and Mitsubishi Paper Mills will contribute to the further development of the culture of photography by supplying high-quality photographic papers that meet customer needs in the world of imaging, which is expected to continue making further development in the future.
*1 Photo prints obtained by exposing and processing photographic emulsion layers containing silver halide and color couplers on the base film

Details of business partnership
(1) FUJIFILM and Mitsubishi Paper Mills will build a cooperate relationship to improve global production efficiency of photographic papers toward enhancing competitive edge of their businesses. As a part of partnership, FUJIFILM shall receive the supply of paper base for producing photographic papers from Mitsubishi Paper Mills.
(2) Mitsubishi Paper Mills will invest in the development of base-paper manufacturing facilities and associated environmental measures (approximately 4 billion yen in total) to ensure stable supply of paper base for producing photographic papers to FUJIFILM. To this end, Mitsubishi Paper Mills will increase capital by approximately 2 billion yen through the third-party allocation of new shares to FUJIFILM.

The two companies will actively build a far-reaching partnership beyond the imaging department to reinforce each other’s individual business operations and international competitiveness, thereby enhancing the corporate values of both parties.

Media Contact:
FUJIFILM Corporation
Corporate Public Relations Division
Tel: +81-3-6271-2000
Management Planning Department,
President’s Office, Mitsubishi Paper Mills Ltd.
Tel: +81-3-3213-3763

Fujifilm’s FinePix S5 Pro Receives EISA Award as European Advanced Camera of the Year 2007- 2008

January 12, 2008

Fujifilm’s FinePix S5 Pro Receives EISA Award as European Advanced Camera of the Year 2007- 2008

Fujifilm Corporation (President and CEO: Shigetaka Komori) is delighted to announce that its FinePix S5 Pro has been voted European Advanced Camera of the Year 2007-2008 by the prestigious European Imaging and Sound Association (EISA), the largest editorial multimedia organization in Europe, with a membership of 50 audio, mobile electronics, video and photo magazines drawn from 20 European countries.

EISA commended the FinePix S5 Pro as follows:
“The special qualities of Fujifilm’s Super CCD SR Pro Sensor provide the wide dynamic range, low image noise and contrast control that make this camera stand out from the general DSLR market. FinePix S5Pro has a rugged body, faster processing, more flexible shooting methods, improved autofocus and advanced flash metering modes. Ultimately, though, it is the S5 Pro’s ability to reproduce a massive range of tones that makes it the winner of this category.”

Highlight features of the FinePix S5 Pro
1. Image Processing and Quality
(1) Real Photo Technology Pro, which combines the Super CCD SR Pro sensor and the RP (Real Photo) Processor Pro, allows for the wide dynamic range with smoother tonality from brightest light to darkest shadow. The re-designed new Super CCD SR Pro features an optimized low-pass filter that will reduce the noise and minimize moire. The newly developed RP (Real Photo) Processor Pro features two cycles of noise reduction so photographers can snap pictures at light sensitivities as high as ISO 3200 with less noise than comparable cameras at similar ISOs.
(2) Photographers can choose from AUTOMATIC and six preprogrammed ranges, 100% (STD), 130%, 170%, 230% (W1), 300% and 400% (W2), for greater creative control over the FinePix S5 Pro’s expanded dynamic range.

2. Toughness and Extended shutter cycle
With its predecessor achieving recognition for its excellent ergonomics, the FinePix S5 Pro will take the system into a different league, using a tough, professional magnesium alloy shell. With weatherproof seals, and first-rate design, the S5 Pro will be a camera truly deserving of the term ‘workhorse’, equally at home in the studio as on a nature assignment in a humid rainforest. The camera’s shutter mechanism will be testament to its durability, as it has been tested to exceed the key benchmark of 100,000 cycles.

3. Enhancement of Film simulation mode
(1) Three new variations of the original film simulation mode have been added (five modes in total) for improved reproduction of natural skin tones to be optimized under various lighting conditions.
(2) With ’Fujichrome’ mode, it will be set to deliver images with the rich saturation that photographers have loved with Fujifilm’s reversal films for many years.

4. Face Detection Technology for post image verification
At the push of a button, the FinePix S5 Pro’s Face Detection Technology detects up to ten faces in a scene immediately after each image is captured. Photographers can zoom in and confirm facial detail, whether eyes are open or closed, focus and exposure on the FinePix S5 Pro’s LCD monitor.

Home > About Fujifilm >News ReleasesIntroducing Fujifilm Computed Radiography Dynamix HR System A high-definition, high-speed, next-generation Computed Radiography System for Non-destructive Testing

January 12, 2008

Introducing Fujifilm Computed Radiography Dynamix HR System
A high-definition, high-speed, next-generation Computed Radiography System for Non-destructive Testing

FUJIFILM Corporation (President and CEO Shigetaka Komori) has announced the debut of the new Dynamix HR System, a high-definition, next-generation computed radiography system and UR-1 high-definition imaging plate for non-destructive testing. A next-generation model of the Fujifilm Computed Radiography digital X-ray inspection system, the Dynamix HR offers high-resolution reading at intervals of 50 micron meters (1 micron meter is 1/1,000 mm), twice the reading density of the previous model, making it capable of detecting even microscopic flaws.
Fujifilm Computed Radiography is an X-ray inspection system that produces highly detailed digital images by recording X-ray radiation on an imaging plate, which is highly sensitive to radiation. An image reader performs optimal reading and digital image processing in accordance with the material and other characteristics of the target object. The ability to create a digitized image of the target object allows the images to be quickly displayed and the inspection data to be networked. This inspection system has a wide range of uses, including the detection of flaws in aviation, automotive, power generation facility and other components, and in maintenance inspections of factory facilities.
According to recent studies, the HR system has shown particularly great promise in the aircraft engine industry for its fine detail capability and the detection of tiny flaws.
The newly developed Dynamix HR System meets market needs for defect detection using high-definition, high-quality inspection images of the inspection target. The images recorded onto the newly developed high-definition UR-1 imaging plate can be read at a density of 50 micron meters, double the previous reading density, and displayed onto PC monitors supporting high resolution images. As a result, the new system can be used for inspections of casting or welding components with thickness variation (a mixture of thin and thick parts), and for defect inspections of special alloy parts. With its capability of reading at a density of 50 micron meters, the introduction of the HR system has been especially highly acclaimed in the aircraft engine industry as the detection of flaws in jet engine components has proven problematic with a conventional reading precision of 100 micron meters.
In addition, the Dynamix HR System can swiftly digitize the X-ray image of the target, quickly reading imaging plates up to 35.4 x 43.0 cm – a size suitable for inspections of large components – in as short a time as 93 seconds. And with its compact design, it is only around 60% the size and weight of the previous model, making it ideal for installation in all kinds of locations, including testing rooms, research facilities, and mobile inspection vehicles.
Fujifilm is also simultaneously launching its Dynamix Series 5 System with a reading pitch of 100 micron meters.
Fujifilm will continue to develop innovative technologies that meet the needs of customers who require X-ray inspection solutions for non-destructive testing.

1. Launch date: July 2007
2. Name of product: Fujifilm Computed Radiography Dynamix HR System
3. Principal features:
(1) Fujifilm’s newly developed Dynamix HR 50-micron meter reader system, high-definition UR-1 imaging plate, and Fujifilm proprietary image processing technologies that create high-definition, high-quality images for imaging plates up to 35.4 x 43.0 cm.
(2) Compatible with newly developed UR-1 and conventional ST-VI imaging plates. (ST-VI supports 100 micron meter reading resolution).
(3) High-speed reading: The reading cycle speed for the 35.4 x 43.0 cm imaging plate is 93 seconds at 50 micron meters, and 58 seconds at 100 micron meters.
(4) Reader is compact and lightweight: 60% smaller and lighter than the existing reader.

4. Main specifications
(1) Compatible imaging plates:
UR-1: (35.4 x 43.0 cm, 24 x 30 cm, 18 x 24 cm)
ST-VI: (35.4 x 43.0 cm, 25.2 x 30.3 cm, 24 x 30 cm, 20.1 x 25.2 cm, 18 x 24 cm, 15 x 30 cm)
(2) Compatible cassettes:
Type-UR (35.4 x 43.0 cm, 24 x 30 cm, 18 x 24 cm)
Type-CC (35.4 x 43.0 cm, 25.2 x 30.3 cm, 24 x 30 cm, 20.1 x 25.2 cm, 18 x 24 cm, 15 x 30 cm)
(3) Reading pitch: 50 micron meters (with UR-1), 100 micron meters (with ST-VI)
(4) Reading cycle time: 93 sec.* (35.4 x 43.0 cm, 50 micron meter pitch), 58 sec.* (35.4 x 43.0 cm, 100 micron meter pitch)
*At appropriate X-ray exposure levels
(5) Reader dimensions/weight: 590 (W) x 380 (D) x 810 (H) mm / 99 kg (approx.)

5. Dynamix Series 5 System (Launched simultaneously)
(1) 100 micron meter reading pitch
(2) Takes ST-VI imaging plate, Type-CC cassette

Media Contact:
FUJIFILM Corporation
Corporate Public Relations Division
Tel: 81-3-6271-2000
FUJIFILM website:
Japanese : http://fujifilm.jp/
English : http://www.fujifilm.com/